Niraj Anand | GICN

Vice President, Technology and Manufacturing Group | Director, Portland Technology Development Lithography
Intel



Description


Niraj Anand is vice president of the Technology and Manufacturing Group and director of Portland Technology Development Lithography at Intel Corporation. Anand is responsible for the lithography equipment and process development and transfer of next-generation silicon patterning technologies that will produce future Intel microprocessors.

Anand joined Intel in 1995, working as a process engineer in the Portland Technology Development Group. Since then, he has held various technical and management positions in the lithography group. In his development role, Anand has worked on the past seven process technologies, from early development to high-volume ramp.

Anand developed and delivered layers and equipment as an engineer and oversaw lithography development as a group leader and as lithography area manager. He was responsible for the development and implementation of ArF immersion lithography on Intel’s most recently ramped 32nm process technology.

Anand received his bachelor’s degree in physics from University of Minnesota in 1989 and received his master’s degree (1991) and Ph.D. (1995) in applied physics from Harvard University. He has been awarded two Intel Achievement Awards.

Source : Intel

 

Professional Details


Designation Vice President, Technology and Manufacturing Group | Director, Portland Technology Development Lithography
Company Intel
Education University of Minnesota (Bachelor's in Physics) | Harvard University (Master's and Ph.D. in Applied Physics)
Country United States of America
Category